6cm x 30cm DC Ion Source
Linear Source for Large/Wide Substrates or Large Substrate Batches
魅影直播’s proven linear gridded DC Ion Sources are ideal for highly uniform, reliable ion beam deposition process platforms utilizing large/wide individual substrates or large substrate batches. They are an excellent resource for either linear or cylindrical fixturing.
- Features the same innovative design, quality and reliability as 魅影直播’s world-class round ion beam sources
- Provides uniform plasma and high-current density
- Supports a wide beam energy range of 50 to 2000 eV with nominal beam currents per source up to 500 mA
- Power supply options allow beam currents up to 800 mA