Savannah – Thermal ALD for R&D
Advanced Capabilities for Advanced Research
魅影直播 is the leading provider of atomic layer deposition (ALD) systems for research and industry worldwide, delivering comprehensive services and versatile, turnkey systems that are accessible, affordable and accurate to the atomic scale. Thin film deposition is our expertise. Our Savannah庐 Series of thin film deposition tools exemplifies these competencies.
Savannah庐 has become the preferred system for university researchers worldwide engaged in ALD and looking for an affordable yet robust platform. We have delivered hundreds of these systems in the past decade. Savannah庐鈥檚 efficient use of precursors and power-saving features substantially reduces the cost of operating a thin film deposition system.
Key features include:
- In-Situ Ellipsometry
- In-Situ QCM
- Self Assembling Monolayers
- 2-Second Cycle Times
- Integrated Ozone
- Low Vapor Pressure Deposition
- Batch Processing
- Glove Box Integration
Savannah庐 is equipped with high-speed pneumatic pulse valves to enable our unique Exposure Mode鈩� for thin film deposition on Ultra High Aspect Ratio substrates. This proven precision thin film coating methodology can be used to deposit conformal, uniform films on substrates with aspect ratios of greater than > 2000:1. Savannah庐 is available in three configurations: S100, S200, and S300. Savannah庐 is capable of holding substrates of different sizes (up to 300mm for the S300). The Savannah庐 thin film deposition systems are equipped with heated precursors lines and the option to add up to six lines. Savannah庐 is capable of handling gas, liquid, or solid precursors.
Savannah庐 G2 Technical specifications
| Substrate Size | Savannah S100: up to 100 mm Savannah庐 S200: up to 200 mm Savannah庐 S300: up to 300 mm |
| Dimensions (w x d x h) | Savannah S100: 585 x 560 x 980 mm Savannah庐 S200: 585 x 560 x 980 mm Savannah庐 S300: 686 x 560 x 980 mm |
| Cabinet | Steel with white powder coat paint with removable panels and lockable precursor door |
| Operational Modes | Continuous Mode鈩� (high speed) or Exposure Mode鈩� (ultra-high aspect ratio) |
| Power | 115 VAC or 220 VAC,1500 W (excluding pump) |
| Controls | LabVIEW鈩�, Windows鈩� 7, Lenovo Laptop, USB control |
| Maximum Substrate Temperature | S100: RT – 400 掳C S200: RT – 350 掳C S300: RT – 350 掳C |
| Deposition Uniformity | (Al2O3) <1% (1蟽) |
| Cycle Time | <2 seconds per cycle with Al2O3聽at 200 掳C |
| Vacuum Pump | Alcatel 2021C2 鈥� 14.6 CFM |
| Compatibility | Clean room class 100 compatible |
| Compliance | CE, TUV, FCC |
| Precursor Delivery System, Ports | 2 lines standard, up to 6 lines available Each line accommodates solid, liquid and gas precursors Lines can be independently heated up to 200 掳C |
| Precursor Delivery System, Valves | Industry standard high speed ALD valves with 10 msec response time |
| Precursor Cylinders | Individually heated 50 ml stainless steel cylinders, optional larger cylinders available |
| Carrier/Venting Gas | N2聽mass flow controlled, 100 SCCM |
| Options | Low Vapor Pressure Delivery (LVPD) System Ozone Generator Dome lid for wafer cassette or 3D objects Glove box Interface In-Situ Ellipsometry In-Situ Quartz Crystal MicroBalance (QCM) Self Assembling Monolayers (SAMs) Particle Coating |